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2 inch GaAs Wafer

Specific Information
Gallium arsenide(GaAs) can be used for various transistor types like High-electron-mobility transistor (HEMT) and Heterojunction bipolar transistor (HBT), also can be used in other fields like mobile phones,satellite communications,microwave point-to-point links and higher frequency radar systems,infrared light-emitting diodes,laser diodes,and optical windows.GaAs is often used as a substrate material for the epitaxial growth of other semiconductors, including indium gallium arsenide,aluminum gallium arsenide and others.
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  • specification
  • Properties
  •                            
     
    Item Gallium Arsenide Substrate(2~6inch )
    Diameter 50.8±0.3mm 76.2±0.3mm 100.0±0.3mm 150.0±0.5mm
    Thickness 350±25μm 350±25μm 350±25μm 675±25μm
    Surface Orientation (100) 15.0˚± 1.0˚ off toward (111) <100>±1.0°
    Primary Flat Orientation EJ<0-1-1>±1.0°
    Primary Flat Length 12.0±1.5mm 22.0±2.0mm 32.0±2.0mm Notch
    Secondary Flat Orientation EJ<0-1 1>±1.0° N/A
    Secondary Flat Length 7.0±1.5mm 12.0±2.0mm 18.0±2.0mm N/A
    Front Surface Finish Epi-polished
    Back Surface Finish SSP:Etched; DSP:Epi-polished
    Laser Mark Back side
    TTV ≤10μm ≤10μm ≤15μm ≤20μm
    BOW ≤12μm ≤15μm ≤20μm ≤25μm
    WARP ≤15μm ≤20μm ≤25μm ≤30μm
    Edge Exclusion ≤3mm
    Application Conductivity for LED Conductivity for LD Semi-insulating for microelectronics
    Conduction Type N-Type N-Type Insulating
    Dopant Si-doping Si-doping Undoped
    Resistivity (1~9)E-3Ω·cm (1~9)E-3Ω·cm >1E7Ω·cm
    Etch Pit Density(EPD) <5000/cm2 <500/cm2 <5000/cm2
    Carrier Concentration (0.4~4)E18/cm3 (0.4~2.5)E18/cm3 N/A
    Mobility >1000cm2/v.s 1500~3000cm2/v.s >4000cm2/v.s

     

    Customization specifications:

    * Various sizes and shapes such as 10*10mm.

    * Various types:like P-Type(Zn-doped)

    * Various orientations such as(111),(110),Off-Axis:2°/6°/10°.

    * Various surface roughness such as slicing,lapping.

    * GaAs crystal ingots are available.

  • Gallium arsenide(GaAs) is an inorganic compound,which is a zinc blende crystal structure, and a black-gray solid with a melting point of1238°C. It is stably below 600°C and is not corroded by non-oxidizing acids. Compared with single crystal silicon(Si), it belongs to the second generation of semiconductor materials and also is a III-V direct band gap semiconductor.

     

    Gallium arsenide(GaAs) has a direct band gap, higher electron mobility, high-frequency low-noise, and high conversion efficiency and other advantages in comparison to silicon(Si).

     

    Crystal Structure Cubic
    Lattice Constant(nm) a=5.6534 Å  
    Density(g/cm3) 5.316
    Melting point(℃) 1238
    Mohs Hardness(mohs) 5.6
    Dielectric Constant 13.1
    Band Gap(eV) 1.424
    Breakdown Electrical Field (MV/cm) 3.3

    Thermal Conductivity(W/cm.K)

    0.55
    Thermal Expansion  5.8*10-6/k
    Refractive Index  3.24-3.33

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